Facility

Shin-Etsu Isesaki Photoresist Plant (Gunma, NEW)

Shin-Etsu Chemical fourth photoresist facility under construction in Isesaki, Gunma Prefecture; ¥83B (~$547M) investment; ~150,000 m² facility; scheduled completion 2026. Anticipatory capacity buildout for 2nm/3nm node demand surge. Source: https://www.shinetsu.co.jp/en/news/news-release/shin-etsu-chemical-to-build-a-new-production-base-in-japan-which-will-become-its-fourth-production-base-for-semiconductor-lithography-materials/