chemical · input

Disilane (Si₂H₆) — Low-Temperature CVD

Higher-order silane used for low-temperature epitaxial silicon deposition in advanced DRAM and 3D NAND manufacturing. Disilane deposits silicon at ~500°C vs ~800°C for monosilane — enabling deposition on thermally sensitive structures in stacked memory. Used in selective epitaxial growth (SEG) for source/drain regions in FinFETs. Niche but critical: no qualified substitute for specific DRAM node transitions.

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Source countries

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Companies

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Goods affected

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Claims on record

Where it comes from

Source countries

Share of global supply, by country.

CountryShare of supply
JPJapan28%
KRSouth Korea22%
USUnited States15%
TWTaiwan12%
CNChina10%
FRFrance8%

Who makes it

Supplier companies

8 companies produce disilane (si₂h₆) — low-temperature cvd.

SK Materials

HQ KR20% share

World's largest NF₃ AND one of top WF₆ producers; subsidiary of SK Group. Revenue ~₩1.2T (2024). Operates Gyeongbuk (Yeongju) facility for both NF₃ and WF₆ using shared HF/F₂ feedstock infrastructure. SK Materials is the only company in the world that is simultaneously a top-3 producer of both NF₃ (chamber cleaning) and WF₆ (CVD tungsten) — making it a dual critical chokepoint for advanced semiconductor manufacturing.

Air Liquide S.A.(AI)

HQ FR18% share

World's largest industrial gas company; provides gas odorant distribution and blending services globally including ethyl mercaptan. Air Liquide distributes and markets mercaptan gas odorants to LPG and natural gas utilities. Also a leading producer of industrial gases (oxygen, nitrogen, hydrogen, noble gases) for healthcare, industry, and energy. Air Liquide is listed among the top ethyl mercaptan market participants; primarily as a specialty gas blender/distributor rather than a primary mercaptan chemical producer.

SK Inc. Materials (SK Specialty / SK ecoplant)

HQ KR14% share

Second largest global SiH4 producer; largest global WF6 producer; 1 trillion won capacity doubling investment; building US plant with Showa Denko for North American chipmakers

Showa Denko K.K. (Resonac Holdings)

HQ JP12% share

Japanese specialty chemicals; key disilane producer for semiconductor CVD; high-purity Si2H6 for NAND flash and logic ICs; also building US silane facility JV with SK Materials

Mitsui Chemicals(4183.T)

HQ JP10% share

Japanese chemical conglomerate (TYO: 4183, HQ Tokyo); recognized as the quality leader for ultra-high-purity electronic grade IPA for semiconductor applications, achieving parts-per-billion impurity levels. In Q2 2024, Mitsui Chemicals introduced a bio-based IPA derived from renewable acetone with 25,000 MT/year initial capacity — part of Japan's push toward bio-based chemicals. Mitsui is one of the world's leading specialty chemical companies with deep ties to the Mitsui Group keiretsu (same group as Mitsui & Co. trading, Mitsui Fudosan real estate, etc.). Mitsui Chemicals' IPA is particularly important for Japanese and Taiwanese semiconductor fabs. The company that dominates bio-based IPA is also part of the same industrial group that owns one of Japan's largest steel mills (Nippon Steel was historically Mitsui-linked).

Taiwan Speciality Chemicals Corp (TSCC)

HQ TW8% share

Taiwan-based disilane supplier for regional semiconductor cluster (TSMC, UMC); regional supply chain expertise; focus on Taiwan and Asia-Pacific fabs

REC Silicon(RECSI.OL)

HQ NO7% share

Norwegian polysilicon producer with US manufacturing history. Operates Butte, MT facility (FBR — Fluidized Bed Reactor polysilicon; 1,500 MT/yr granular polysilicon capacity). Previously operated Moses Lake, WA plant (18,000 MT/yr) which was idled in 2019 due to Chinese trade war tariffs blocking exports to China. Moses Lake restart discussions ongoing; DOE loan guarantees under consideration. REC Silicon is the primary non-Chinese Western polysilicon producer with US domestic capacity.

Wonik Materials

HQ KR5% share

Korean specialty gas producer; disilane and other CVD precursors; serves Samsung, SK Hynix memory fabs in South Korea