chemical · input

EUV Photoresist

Chemically amplified resist used in EUV lithography patterning steps. Highly specialized; JSR, Shin-Etsu Chemical, and Tokyo Ohka Kogyo (all Japanese) together supply the majority of global EUV photoresist. US export-controlled.

4

Source countries

7

Companies

1

Goods affected

0

Claims on record

What depends on it

Goods that need this input

1 essential American goods rely on euv photoresist somewhere upstream in their supply chain.

Where it comes from

Source countries

Share of global supply, by country.

CountryShare of supply
JPJapan83%
USUnited States11%
KRSouth Korea3%
DEGermany2%

Who makes it

Supplier companies

7 companies produce euv photoresist.

JSR Corporation

HQ JP32% share

JSR Corporation (Tokyo; formerly JASDAQ/TSE: 4185; now private after delisting following Japan Investment Corporation nationalization in 2023) is Japan's leading life science materials company and manufacturer of Amsphere A3 Protein A affinity resin — one of the fastest-growing Protein A resin brands. JSR's Amsphere A3 uses a novel polymer bead architecture (highly cross-linked polymethacrylate) with proprietary recombinant Protein A ligand — designed for high dynamic binding capacity and long resin lifetime. In April 2023, the Japanese government's sovereign industrial fund INCJ (Innovation Network Corporation of Japan, now JIC) acquired a majority stake in JSR Corporation and took it private — an extraordinary step justified by JSR's dual strategic importance in semiconductor photoresists (JSR is the world's #2 photoresist producer, supplying TSMC and Samsung) and bioprocess materials (Amsphere A3). Japan explicitly nationalized JSR to prevent acquisition by non-Japanese parties and to secure domestic control of critical semiconductor and bioprocess supply chains — a template for strategic industry policy that no other major economy had applied to a life science materials company.

Shin-Etsu Chemical(SHECY)

HQ JP23% share

Shin-Etsu Chemical Co., Ltd. (Tokyo; TSE: 4063; ~¥2.3 trillion revenue) is Japan's second-largest EUV photoresist supplier, holding approximately 20-25% of the EUV photoresist market through its SEPR (Shin-Etsu Polymer Resist) product line. Primary EUV resist production at Niigata and Gunma facilities in Japan. The same parent company is the world's largest polyvinyl chloride (PVC) producer, the world's largest silicon wafer producer (through Shin-Etsu Silicones/SEH), and a major hydroxypropyl methylcellulose (HPMC) pharmaceutical excipient manufacturer. Shin-Etsu's photoresist was among the materials covered by Japan's July 2019 export controls targeting South Korea, as fluorinated polyimide — a resist ancillary material — was one of the three restricted chemicals.

Tokyo Ohka Kogyo (TOK)

HQ JP18% share

Tokyo Ohka Kogyo Co., Ltd. (TOK; Kawasaki, Kanagawa; TSE: 4186; ~¥260B revenue) is Japan's third-largest EUV photoresist manufacturer, holding approximately 15-20% of the global EUV photoresist market. TOK's primary EUV resist production is at its Kanagawa (Kawasaki) plant. TOK operates the TAJRC (Tama Advanced Research Joint Center) in Tama, Tokyo — a next-generation resist development laboratory focused on High-NA EUV and metal-oxide resist chemistries. TOK's fluorinated polyimide was one of the three chemicals targeted in Japan's July 2019 export controls on South Korea. Also produces chemical mechanical planarization (CMP) slurries and developer chemicals for semiconductor fabs.

Fujifilm Holdings

HQ JP10% share

Fujifilm Holdings Corporation (Tokyo; TSE: 4901; ~¥3.6 trillion revenue) is an aggressively expanding EUV photoresist supplier, targeting approximately 10% of the global EUV resist market through its Electronic Materials division. Fujifilm's EUV resist production facility is at Yoshida-Minami, Shizuoka, Japan. Fujifilm's pivot from consumer photography (film and cameras) to semiconductor chemicals and medical imaging systems is one of the most dramatic industrial transformations in Japanese corporate history — the same company known for photographic film for 90 years is now developing photoresist for 13.5nm EUV lithography. Fujifilm's photochemistry expertise from film manufacturing transferred directly to photoresist development.

DuPont Electronics (DuPont de Nemours)

HQ US8% share

DuPont Electronics & Industrial is the semiconductor materials division of DuPont de Nemours, Inc. (NYSE: DD; Wilmington, Delaware). DuPont's EUV photoresist operation is headquartered at Marlborough, Massachusetts, and represents approximately 8% of the global EUV-specific photoresist market — the only significant non-Japanese EUV resist supplier globally. DuPont's photoresist heritage traces to its acquisition of Shipley Company (2000) and Rohm and Haas Electronic Materials (2009), which brought chemically amplified resist chemistry expertise. DuPont's Marlborough MA facility is the primary U.S. foothold in a market dominated ~92% by Japanese companies. DuPont EUV resists are qualified at Intel's advanced nodes and serve as a diversification option for fabs seeking to reduce Japan supply dependence.

Inpria (JSR Inpria)

HQ US3% shareSOLE SUPPLIER

Inpria Corporation (Corvallis, Oregon; acquired by JSR Corporation in 2023 for approximately $514M) is the world's only commercial supplier of metal-oxide (tin-oxide-based) EUV photoresist — a fundamentally different chemistry from conventional chemically amplified resists (CAR). Inpria's tin-oxide resist offers higher EUV photon absorption, higher etch resistance, and thinner film potential than organic CAR resists, enabling higher resolution patterning for sub-2nm High-NA EUV nodes. JSR/Inpria is now the sole commercial supplier of metal-oxide EUV resist, having beaten all competitors to commercial scale. TSMC and Intel are both qualifying JSR/Inpria metal-oxide resist for their most advanced nodes. Inpria was founded in 2007 as a spin-out from Oregon State University's chemistry department.

ASML(ASML)

HQ NLSOLE SUPPLIER

Sole manufacturer of EUV (extreme ultraviolet) lithography machines, which are required to fabricate chips at ≤7nm. 100% monopoly on EUV; 90%+ share of overall lithography market.