Facility
Inpria (JSR) Metal-Oxide Resist Facility (Corvallis, Oregon)
Inpria's Corvallis, Oregon facility is the world's only commercial-scale manufacturing site for metal-oxide (tin-oxide) EUV photoresist — a next-generation resist chemistry that replaces traditional organic chemically amplified resists for High-NA EUV patterning. Acquired by JSR Corporation in 2023 for approximately $514M. This facility represents the sole commercial source of the resist chemistry required for ASML's High-NA EUV (EXE:5000) scanners at sub-2nm logic nodes. The entire pipeline of High-NA EUV patterning — from ASML's $380M machine to the world's most advanced chips — depends on materials produced at this single Oregon facility. Source: https://www.inpria.com
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